Laser Annealing Processes in Semiconductor Technology Books

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Laser Annealing Processes in Semiconductor Technology


Laser Annealing Processes in Semiconductor Technology
  • Author : Fuccio Cristiano
  • Publisher : Woodhead Publishing
  • Release : 2021-04-30
  • ISBN : 9780128202562
  • Language : En, Es, Fr & De
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Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors

Laser Annealing of Semiconductors


Laser Annealing of Semiconductors
  • Author : J Poate
  • Publisher : Elsevier
  • Release : 2012-12-02
  • ISBN : 9780323145428
  • Language : En, Es, Fr & De
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Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with condensed matter; the calculation of thermophysical properties of crystalline materials; and high-speed crystal growth by laser annealing of ion-implanted silicon. The subsequent chapters describe the microstructural and topographical properties of annealed semiconductor layers and the epitaxy of ion-implanted silicon irradiated with a laser or electron beam single pulse. This text also explores the electronic and surface properties and the continuous-wave beam processing of semiconductors. The concluding chapters cover various reactions in metal-semiconductor systems, such as fast and laser-induced melting, solidification, mixing, and quenching. Laser-induced interactions in metal-semiconductor systems and the factors involved in control of the heat treatment process are also discussed in these chapters. Materials scientists and researchers and device engineers will find this book invaluable.

2011 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors ULSIC vs TFT


2011 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors  ULSIC vs  TFT
  • Author :
  • Publisher : The Electrochemical Society
  • Release : 2011
  • ISBN : 9781566778992
  • Language : En, Es, Fr & De
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Silicon Compatible Emerging Materials Processes and Technologies for Advanced CMOS and Post CMOS Applications 9


Silicon Compatible Emerging Materials  Processes  and Technologies for Advanced CMOS and Post CMOS Applications 9
  • Author : F. Roozeboom
  • Publisher : The Electrochemical Society
  • Release : 2019-05-17
  • ISBN : 9781607688686
  • Language : En, Es, Fr & De
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This issue of ECS Transactions includes papers based on presentations from the symposium "Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9," originally held at the 235th ECS Meeting in Dallas, Texas, May 26-30, 2019.

Scientific and Technical Aerospace Reports


Scientific and Technical Aerospace Reports
  • Author :
  • Publisher :
  • Release : 1985
  • ISBN : STANFORD:36105007168664
  • Language : En, Es, Fr & De
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